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以鈮摻雜氧化鈦(TiO2 : Nb)導電墊層改善熱致變色氧化釩(VO2)轉換特性之研究 = The improvement of thermochromic VO2 on transition properties using a conductive pad layer of TiO2 : Nb films / 林軒宇.

館藏資訊

摘要註

本研究的目的是利用高功率磁控脈衝濺鍍技術 (HIPIMS) 製備具有熱致變色效應的二氧化釩 (VO2) 薄膜，並藉由改變不同二氧化鈦 (TiO2) 與元素鈮 (Nb) 摻雜比例及結構來做比較，同時探討元素鈮 (Nb) 摻雜致二氧化鈦 (TiO2) 緩衝層對其結構和光學性質的影響，以及利用原子層沉積技術 (Atomic Layer Deposition , ALD) 鍍製氧化鉬 (MoOx) 作為抗氧化保護層於二氧化釩 (VO2) 薄膜之上。本研究採用高功率脈衝磁控濺鍍技術 (HIPIMS) 在含氧氣的環境下，將MoOx/VO2/Nb-TiO2/glass結構的二氧化釩 (VO2) 熱致變色薄膜沉積在玻璃基板上。二氧化釩 (VO2) 的厚度固定為75 nm。本研究改變了氧氣流量的大小，並將薄膜定在500 ℃ 的環境溫度下恆溫退火3分鐘，以研究其對結構和光電性質的影響。使用X光繞射分析儀 (XRD) 測量分析二氧化釩 (VO2) 薄膜的結晶相結構，發現以Nb-TiO2作為緩衝層的二氧化釩 (VO2) 薄膜，在經過升溫至500 ℃ 、持溫3分鐘退火處理後，在繞射角2θ=27.8 o與37.0 o時出現了從單斜晶相 (Monoclinic) 到四方晶相 (Tetragonal) 的相轉變。使用紫外光/可見光/近紅外光 (UV-Vis-NIR) 光譜儀以波長300 nm-2700 nm測量二氧化釩 (VO2) 薄膜在室溫 (25 ℃ ) 和高溫 (85 ℃ ) 下的穿透率、吸收率和反射率，發現薄膜具有明顯的熱致變色效應，且隨著氧氣流量的增加，熱致變色效應也有所增強，其波長為2500 nm的近近紅外光穿透率之高低溫變化從13% 提升至31% ，並且觀測到在於室溫時有較高的紅外光穿透，而在高溫時則能夠阻擋紅外光的穿透，藉由不同緩衝層的結構做比較，可以得知當摻雜Nb進入TiO2緩衝層時，熱致變色的效果也會有所提升。並且在二氧化釩 (VO2) 薄膜上鍍製氧化鉬 (MoOx) 抗氧化保護層後，可以提高可見光波段的穿透率至60% 以上，改善二氧化釩 The purpose of this study is to prepare thermochromic vanadium dioxide (VO2) thin films using High Power Impulse Magnetron Sputtering (HIPIMS) technology. In this study, we compare thermochromic propaties with different doping niobium (Nb) of ratios at titanium dioxide (TiO2). Additionally, molybdenum oxide (MoOx) is deposited as an anti-oxidation protective layer on the VO2 thin films by Atomic Layer Deposition (ALD). The study utilizes HIPIMS technology to deposit the thermochromic VO2 thin films onto glass substrates in an oxygen-containing ambient. The thickness of VO2 is fixed at 75 nm. The oxygen flow rate is varied, and the films are post-annealed at a constant temperature of 500°C for 3 minutes to study its impact on their structural and optoelectronic properties. X-ray diffraction (XRD) analysis is used to measure and analyze the crystalline phase structure of the VO2 films. It is found that VO2 films with an Nb-TiO2 buffer layer exhibited a monoclinic at diffraction angles 2θ = 27.8° and 37.0° after annealing at 500°C for 3 minutes. Ultraviolet/visible/near-infrared (UV-Vis-NIR) spectrophotometry is used to measure the transmittance, absorbance, and reflectance of the VO2 films at wavelengths of 300 nm to 2700 nm at room temperature (25°C) and high temperature (85°C). The films show significant thermochromic effects. The thermochromic property is enhanced as the oxygen flow rate increased. The difference in near-infrared transmittance at a wavelength of 2500 nm between low and high temperatures increased from 13% to 31% . At room temperature, the films perform higher infrared transmittance, while at high temperatures, they could block infrared transmittance. Comparing different buffer layer structures indicates that Nb doping in the TiO2 buffer layer enhances the thermochromic effect. Moreover, VO2 thin films with a MoOx anti-oxidation protective layer increases the visible light transmittance to over 60%, addressing the low visible light transm

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